science-softCon uv/vis+ photochemistry database; www.photochemistry.org; (C) science-softCon 2019 Substance: hypochloric acid Other Names: Formula: HOCl CAS-No.: 7790-92-3 Study: photodecomposition, quantum yields Authors: P.J.D. Butler, L.F. Phillips Title: Upper limit for the atomic oxygen yield in the 308-nm photolysis of hydrogen oxide chloride (HOCl) Journal/Source: J. Phys. Chem., 87 (1), 183-184, (1983); DOI: 10.1021/j100224a040 Data: Energy/Wavelength range: 308 nm Resolution: Temperature: Temperature dependence: Pressure/Concentration: Phase: pH: Comments: An upper limit of PHI(HOCl + hv --> HCl + O) < 0.02 was determined at 308 nm. Author to whom correspondence should be addressed: (e-mail address):